MIIT Promotes Domestic DUV Lithography Machines with ≤8nm Overlay Accuracy

In recent months, the Ministry of Industry and Information Technology (MIIT) issued the "Guidelines for the Promotion and Application of First (Set) Major Technical Equipment (2024 Edition)". This paves the way for full-process localization of mature chip manufacturing for nodes above 28nm!

Although 28nm technology isn’t cutting-edge, it holds significant importance as the dividing line between low-to-mid-end and mid-to-high-end chips. Aside from advanced CPUs, GPUs, and AI chips, most industrial-grade chips rely on 28nm or higher technologies.

MIIT Promotes Domestic DUV Lithography Machines with ≤8nm Overlay Accuracy

Working Principle: Advancements in Deep Ultraviolet Lithography
KrF (Krypton Fluoride) and ArF (Argon Fluoride) lithography machines fall under the category of Deep Ultraviolet (DUV) lithography. Both utilize specific light wavelengths projected through optical systems onto the photoresist layer of a silicon wafer, transferring intricate circuit patterns.
KrF Lithography Machines: Use a 248nm wavelength light source, achieving resolutions below 110nm, suitable for various integrated circuit manufacturing processes.
ArF Lithography Machines: Use a 193nm wavelength light source, offering higher resolution for sub-65nm process technologies, enabling the fabrication of finer circuits.

Technological Significance: Industry Upgrade and Self-Reliance
The development of these lithography machines marks a major milestone in advancing semiconductor manufacturing and achieving industrial autonomy:
Technical Breakthroughs: The successful creation of KrF and ArF lithography machines highlights significant progress in high-end lithography technology, providing robust technical support for semiconductor manufacturing.
Industry Upgrade: High-precision lithography machines enable the production of more complex and high-performance integrated circuits, driving innovation across the entire semiconductor value chain.
Economic and National Security: By reducing dependence on foreign technology, these machines strengthen the domestic semiconductor industry's self-sufficiency, bolstering economic and industrial security.

Water Chiller: The Key to Stable Lithography Machine Performance
Precise temperature control is essential for ensuring the quality and yield of the lithography process. Water chillers, as core components of cooling systems, play a vital role:
Cooling Requirements: Lithography machines are extremely sensitive to temperature fluctuations during exposure, necessitating water chillers that provide highly accurate and stable temperature control.
Functions of Chillers: By circulating cooling water, chillers effectively dissipate heat generated during operation, maintaining laser equipment within an optimal temperature range and ensuring accuracy and reliability in the lithography process.

Ultrafast laser chiller CWUP-20ANP with 0.08℃ stability

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